Chip-level CMP Modeling and Smart Dummy for HDP and Conformal CVD Films

نویسندگان

  • George Yong Liu
  • Ray F. Zhang
  • Kelvin Hsu
  • Lawrence Camilletti
چکیده

Chip-level CMP modeling is investigated to obtain the post-CMP film profile thickness across a die from its design layout file and a few film deposition and CMP parameters. The work covers both HDP and conformal CVD film. The experimental CMP results agree well with the modeled results. Different algorithms for filling of dummy structure are compared. A “smart” algorithm for dummy filling is presented, which achieves maximal pattern-density uniformity and CMP planarity.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Modeling of chemical mechanical polishing for shallow trench isolation

Chemical mechanical polishing (CMP) is a key process enabling shallow trench isolation (STI), which is used in current integrated circuit manufacturing processes to achieve device isolation. Excessive dishing and erosion in STI CMP processes, however, create device yield concerns. This thesis proposes characterization and modeling techniques to address a variety of concerns in STI CMP. Three ma...

متن کامل

Full-Chip CMP Simulation System

In this paper, we present a Full-chip CMP simulation system. We discuss three problems in practical use of CMP simulation system: how to handle huge chip data, ECP model accuracy, and how to predict the errors effectively. We propose solutions to the problems as follows: First, we develop a data extraction tool from GDSII. Dummy fill insertion function of this tool can reduce the data size of G...

متن کامل

Using Smart Dummy Fill and Selective Reverse Etchback for Pattern Density Equalization

The techniques of dummy fill and reverse etchback are often used prior to a chemical mechanical polishing (CMP) process to prevent film pattern density mismatches that lead to post-CMP film thickness variation. In this work, we present a methodology that utilizes both techniques in an intelligent fashion, and shows that both techniques can be used together to create a better balance of pattern ...

متن کامل

High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits

In this paper, we present and review recent developments in the high-density plasma chemical vapor deposition (HDP CVD) of silicon-based dielectric films, and of films of recent interest in the development of lower-dielectric-constant alternatives. Aspects relevant to the HDP CVD process and using the process to achieve interlevel insulation, gap filling, and planarization are discussed. Result...

متن کامل

Vapor deposition routes to conformal polymer thin films

Vapor phase syntheses, including parylene chemical vapor deposition (CVD) and initiated CVD, enable the deposition of conformal polymer thin films to benefit a diverse array of applications. This short review for nanotechnologists, including those new to vapor deposition methods, covers the basic theory in designing a conformal polymer film vapor deposition, sample preparation and imaging techn...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • CoRR

دوره cs.CE/0011014  شماره 

صفحات  -

تاریخ انتشار 2000